- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor
- G03F 7/039 - Macromolecular compounds which are photodegradable, e.g. positive electron resists
Patent holdings for IPC class G03F 7/039
Total number of patents in this class: 4114
10-year publication summary
|
259
|
307
|
302
|
282
|
311
|
285
|
270
|
247
|
362
|
111
|
| 2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| FUJIFILM Corporation | 27102 |
1001 |
| Tokyo Ohka Kogyo Co., Ltd. | 1481 |
475 |
| JSR Corporation | 2476 |
446 |
| Shin-Etsu Chemical Co., Ltd. | 5132 |
420 |
| Sumitomo Chemical Company, Limited | 8808 |
187 |
| Rohm and Haas Electronic Materials LLC | 637 |
121 |
| Taiwan Semiconductor Manufacturing Company, Ltd. | 36809 |
117 |
| Mitsubishi Gas Chemical Company, Inc. | 3188 |
98 |
| LG Chem, Ltd. | 17205 |
54 |
| Merck Patent GmbH | 5909 |
53 |
| Zeon Corporation | 3854 |
52 |
| Samsung Electronics Co., Ltd. | 131630 |
50 |
| International Business Machines Corporation | 60644 |
44 |
| Central Glass Company, Limited | 1244 |
43 |
| Nissan Chemical Industries, Ltd. | 1822 |
27 |
| Toray Industries, Inc. | 6652 |
25 |
| Idemitsu Kosan Co., Ltd. | 3995 |
24 |
| Tokyo Electron Limited | 11599 |
23 |
| Toyo Gosei Co., Ltd. | 111 |
22 |
| Kuraray Co., Ltd. | 3392 |
21 |
| Other owners | 811 |